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Journal of Physics D: Applied Physics

Volumn 45, Issue 22, 2012, Pages

Thin membranes versus bulk substrates: Investigation of proximity effects in focused electron beam-induced processing

(7) Walz, M M a Vollnhals, F a Rietzler, F a Schirmer, M a Kunzmann, A a Steinruck H P a Marbach, H a

a UNIVERSITY OF ERLANGEN NUREMBERG (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AUTOCATALYTIC; BULK SUBSTRATES; ELECTRON BEAM-INDUCED DEPOSITION; ELECTRON INTERACTION; FOCUSED ELECTRON BEAMS; PROCESSING TECHNIQUE; PROXIMITY EFFECTS; SCATTERING PROCESS; SILICON NITRIDE MEMBRANE; SURFACE ACTIVATION; THIN MEMBRANE;

SILICON NITRIDE; SUBSTRATES;

ELECTRON BEAMS;

EID: 84861368619 PISSN: 00223727 EISSN: 13616463 Source Type: Journal
DOI: 10.1088/0022-3727/45/22/225306 Document Type: Article

Times cited : (11)

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