Thermal decomposition of ultrathin oxide layers on Si(111) surfaces mediated by surface Si transport

Applied Physics Letters

Volumn 70, Issue 9, 1997, Pages 1095-1097

  Watanabe, Heiji ^a   Fujita, Ken ^a   Ichikawa, Masakazu ^a  

^a NATL INST FOR ADV INTERDISC RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000439330     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118495     Document Type: Article

References (14)

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14. See, for example, Y.-K. Sun, D. J. Bonser, and T. Engel, J. Vac. Sci. Technol. A 10, 2314 (1992).