Nanofabrication using selective thermal desorption of SiO2/Si induced by electron beams

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 3, 1997, Pages 1493-1498

  Fujita, S ^a   Maruno, S ^a   Watanabe, H ^a   Ichikawa, M ^a  

^a NATL INST FOR ADV INTERDISC RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM IRRADIATION; FOCUSED ELECTRON BEAMS; GE FILMS; NANOFABRICATION; NANOFABRICATION TECHNIQUES; PATTERN TRANSFERS; SI (001) SUBSTRATE; SI (1 1 1); SI AND GE NANOWIRES; SURFACE CHEMICAL REACTIONS; THIN OXIDE FILMS;

ELECTRON BEAMS; ELECTRON OPTICS; GERMANIUM; NANOWIRES; SILICON; SILICON COMPOUNDS; SURFACE CHEMISTRY; SURFACE REACTIONS; THERMAL DESORPTION; DESORPTION; IRRADIATION; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SILICA; SUBSTRATES; THIN FILMS;

OXIDE FILMS; NANOTECHNOLOGY;

ELECTRON BEAM IRRADIATION; PATTERN TRANSFER; SELECTIVE THERMAL DESORPTION;

EID: 0031146065     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580568     Document Type: Article

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