Investigation of proximity effects in electron microscopy and lithography

Applied Physics Letters

Volumn 100, Issue 5, 2012, Pages

  Walz, M M ^a   Vollnhals, F ^a   Rietzler, F ^a   Schirmer, M ^a   Steinruck H P ^a   Marbach, H ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BULK SUBSTRATES; CHARGING EFFECT; FOCUSED ELECTRON BEAMS; MICROSCOPIC TECHNIQUES; NATIVE OXIDE LAYER; PROXIMITY EFFECTS; THIN MEMBRANE;

ELECTRON BEAMS; IRON DEPOSITS;

SILICON NITRIDE;

EID: 84856997501     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3681593     Document Type: Article

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