Surface modification and fabrication of 3D nanostructures by atomic layer deposition

MRS Bulletin

Volumn 36, Issue 11, 2011, Pages 887-897

  Bae, Changdeuck ^a   Shin, Hyunjung ^b   Nielsch, Kornelius ^a  

^a UNIVERSITY OF HAMBURG   (Germany)

^b Kookmin University   (South Korea)

Author keywords

Atomic layer deposition; nanostructure; thin film

Indexed keywords

ANODIC ALUMINUM OXIDE; CHEMICAL PATTERN; COMPLEX NANOSTRUCTURES; DEVICE APPLICATION; OPAL STRUCTURES; POROUS TEMPLATES; RECENT PROGRESS; SURFACE ENGINEERING; THREE-DIMENSIONAL (3D);

ALTERNATIVE FUELS; ANODIC OXIDATION; ATOMIC LAYER DEPOSITION; ATOMS; ENERGY CONVERSION; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; THIN FILMS; THREE DIMENSIONAL;

SURFACES;

EID: 82055166275     PISSN: 08837694     EISSN: None     Source Type: Journal    
DOI: 10.1557/mrs.2011.264     Document Type: Article

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