Light stamping lithography: Microcontact printing without inks

Journal of the American Chemical Society

Volumn 128, Issue 3, 2006, Pages 858-865

  Park, Kyung S ^a   Seo, Eun K ^a   Do, Young R ^a   Kim, Kwan ^b   Sung, Myung M ^a  

^a Kookmin University   (South Korea)

^b Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; DEPOSITION; ETCHING; INK; PRINTING; THIN FILMS; ULTRAVIOLET RADIATION;

ATOMIC LAYER DEPOSITION; LIGHT-STAMPING LITHOGRAPHY (LSL); POLY(DIMETHYLSILOXANE) (PDMS); WET ETCHING;

LITHOGRAPHY;

DIMETICONE; TITANIUM DIOXIDE;

ADHESION; ARTICLE; ATOMIC LAYER DEPOSITION; AUTOMATION; CHEMICAL BINDING; DEPOSITION; LIGHT STAMPING LITHOGRAPHY; PATTERN GENERATOR; SURFACE PROPERTY; ULTRAVIOLET RADIATION;

ADHESION; ETCHING; INK; LITHOGRAPHY; PRINTING; THIN FILMS; ULTRAVIOLET RADIATION;

EID: 31444456146     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja055377p     Document Type: Article

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