Passivation of bottom-gate IGZO thin film transistors

Journal of the Korean Physical Society

Volumn 54, Issue 1 PART 2, 2009, Pages 531-534

  Cho, D H ^a   Yang, S H ^a   Shin, J H ^a   Byun, C W ^a   Ryu, M K ^a   Lee, J I ^a   Hwang, C S ^a   Chu, H Y ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Oxide; Passivation; TFT; Transparent

Indexed keywords

EID: 60049090771     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.54.531     Document Type: Conference Paper

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