A practical, self-catalytic, atomic layer deposition of silicon dioxide

Angewandte Chemie - International Edition

Volumn 47, Issue 33, 2008, Pages 6177-6179

  Bachmann, Julien ^a,b   Zierold, Robert ^a   Chong, Yuen Tung ^b   Hauert, Roland ^c   Sturm, Chris ^d   Schmidt Grund, Rüdiger ^d   Rheinländer, Bernd ^d   Grundmann, Marius ^d   Gösele, Ulrich ^b   Nielsch, Kornelius ^a  

^a UNIVERSITY OF HAMBURG   (Germany)

^b MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^c SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^d UNIVERSITY OF LEIPZIG   (Germany)

Author keywords

Atomic layer deposition; Nanotubes; Silicon oxide; Template synthesis; Thin films

Indexed keywords

ATOMIC PHYSICS; ATOMS; PHYSICAL VAPOR DEPOSITION; PULSED LASER DEPOSITION; SILANES; SILICA; SILICON COMPOUNDS;

NANOTUBES; SILICON OXIDE; TEMPLATE SYNTHESIS; THIN FILMS;

ATOMIC LAYER DEPOSITION;

EID: 53549092746     PISSN: 14337851     EISSN: None     Source Type: Journal    
DOI: 10.1002/anie.200800245     Document Type: Article

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