메뉴 건너뛰기




Volumn 257, Issue 23, 2011, Pages 10065-10071

Silicon oxynitride thin films synthesised by the reactive gas pulsing process using rectangular pulses

Author keywords

Optical emission spectroscopy; Reactive gas pulsing process; Reactive sputtering

Indexed keywords

ARGON; GASES; MASS SPECTROMETRY; NITRIDES; NITROGEN; OPTICAL EMISSION SPECTROSCOPY; REACTIVE SPUTTERING; SILICA; SILICON NITRIDE; SILICON OXIDES;

EID: 80051789282     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.06.141     Document Type: Article
Times cited : (12)

References (56)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.