Stable and unstable conditions of the sputtering mode by modulating at low frequency the current of a magnetron discharge

Surface and Coatings Technology

Volumn 94-95, Issue , 1997, Pages 345-351

  Billard, A ^a   Perry, F ^a   Frantz, C ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

Discharge instability; Low frequency modulation; Reactive magnetron sputtering; Titanium dioxide

Indexed keywords

ARGON; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; INORGANIC COATINGS; OXYGEN; STOICHIOMETRY; TITANIUM DIOXIDE;

SQUARE WAVE MODULATION;

MAGNETRON SPUTTERING;

EID: 0031250076     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00449-0     Document Type: Article

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