Discharge voltage measurements during reactive sputtering of oxides

Thin Solid Films

Volumn 515, Issue 2 SPEC. ISS., 2006, Pages 468-471

  Depla, D ^a   Haemers, J ^a   De Gryse, R ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

Ion induced electron emission; Magnetron; Reactive sputtering

Indexed keywords

ALUMINUM; ARGON; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ELECTRON EMISSION; MAGNESIUM PRINTING PLATES; MAGNETRON SPUTTERING; OXIDATION; PLASMAS; VOLTAGE MEASUREMENT;

DISCHARGE VOLTAGE; ION INDUCED ELECTRON EMISSION; PLASMA IMPEDANCE; REACTIVE SPUTTERING;

OXIDES;

EID: 33748791449     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.256     Document Type: Article

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