SCOPUS 정보 검색 플랫폼

Volumn 252, Issue 15, 2006, Pages 5611-5614

Optical emission spectroscopy investigation of sputtering discharge used for SiO x N y thin films deposition and correlation with the film composition

(6) Rebib, F a Tomasella, E a Thomas, L b Cellier, J a Sauvage, T c Jacquet, M a

a CNRS (France)

b PROMES CNRS (France)

c Centre National de la Recherche Scientifique (France)

Author keywords

Optical emission spectroscopy; Reactive sputtering; Silicon oxynitride

Indexed keywords

ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; LIGHT EMISSION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SPUTTER DEPOSITION;

ARGON-OXYGEN-NITROGEN PLASMA; OPTICAL EMISSION SPECTROSCOPY; REACTIVE SPUTTERING; SILICON OXYNITRIDE;

THIN FILMS;

EID: 33746973316 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2005.12.130 Document Type: Article

Times cited : (10)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.