A simple model for the deposition of W-O coatings by reactive gas pulsing process

EPJ Applied Physics

Volumn 43, Issue 3, 2008, Pages 321-325

  Parreira, N M G ^a   Polcar, T ^a,b   Carvalho, N J M ^c   Cavaleiro, A ^a  

^a UNIVERSITY OF COIMBRA   (Portugal)

^b CZECH TECHNICAL UNIVERSITY IN PRAGUE   (Czech Republic)

^c Bekaert sa   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION RATES; INJECTION (OIL WELLS); MAGNETRONS; NICKEL POWDER METALLURGY; OXYGEN; PROTECTIVE COATINGS; RANGE FINDING; TARGETS; TUNGSTEN; TUNGSTEN COMPOUNDS;

CHEMICAL COMPOSITIONS; OXYGEN FLOW;

MAGNETRON SPUTTERING;

EID: 50849138550     PISSN: 12860042     EISSN: 12860050     Source Type: Journal    
DOI: 10.1051/epjap:2008068     Document Type: Conference Paper

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