Sputter deposition of titanium monoxide and dioxide thin films with controlled properties using optical emission spectroscopy

Thin Solid Films

Volumn 516, Issue 23, 2008, Pages 8473-8478

  Chen, G S ^a   Lee, C C ^a   Niu, H ^b   Huang, Welson ^c   Jann, Robert ^d   Schutte T ^e  

^a FENG CHIA UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^c JunSun Technology Inc   (Taiwan)

^d Applied Optivac Technology Inc   (Taiwan)

^e PLASUS ^*  (Germany)

Author keywords

Anatase; Optical emission spectroscopy; Rutile; Thin films; TiO; TiO2

Indexed keywords

ATOMIC SPECTROSCOPY; EMISSION SPECTROSCOPY; MOLECULAR SPECTROSCOPY; OPTICAL EMISSION SPECTROSCOPY; SPUTTERING; THICK FILMS; TITANIUM;

ANATASE; CONTROLLED PROPERTIES; RUTILE; THIN FILMS; TIO; TIO2; TITANIUM MONOXIDE;

SPUTTER DEPOSITION;

EID: 50849090596     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.04.093     Document Type: Article

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