Study of the mechanical and structural properties of silicon oxynitride films for optical applications

Journal of Non-Crystalline Solids

Volumn 352, Issue 23-25, 2006, Pages 2319-2323

  Criado, D ^a   Alayo, M I ^a   Fantini, M C A ^a   Pereyra, I ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

Ellipsometry; Mechanical, stress relaxation; Nitride glasses; Oxynitride glasses; Rutherford backscattering; X ray diffraction

Indexed keywords

MECHANICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON COMPOUNDS; STRUCTURAL ANALYSIS; X RAY DIFFRACTION ANALYSIS;

MECHANICAL, STRESS RELAXATION; NITRIDE GLASSES; OXYNITRIDE GLASSES;

THIN FILMS;

EID: 33747058535     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2006.03.012     Document Type: Article

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