Reactive gas pulsing process: A method to extend the composition range in sputtered iron oxynitride films

Surface and Coatings Technology

Volumn 202, Issue 19, 2008, Pages 4825-4829

  Petitjean, C ^a   Grafoute M ^a   Rousselot, C ^a   Pierson, J F ^b  

^a FEMTO ST INSTITUTE   (France)

^b INSTITUT JEAN LAMOUR   (France)

Author keywords

Optical properties; Reactive gas pulsing process; Reactive sputtering; Transition metal oxynitrides

Indexed keywords

OPACITY; REACTIVE SPUTTERING; STRUCTURE (COMPOSITION); TRANSITION METAL COMPOUNDS;

OXYNITRIDE FILMS; REACTIVE GAS PULSING PROCESS;

MAGNETRON SPUTTERING;

MAGNETRON SPUTTERING; OPACITY; REACTIVE SPUTTERING; STRUCTURE (COMPOSITION); TRANSITION METAL COMPOUNDS;

EID: 44649112384     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.04.064     Document Type: Article

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