Precise control of multilayered structures of Nb-O-N thin films by the use of reactive gas pulsing process in DC magnetron sputtering

Surface and Coatings Technology

Volumn 202, Issue 11, 2008, Pages 2358-2362

  Fenker, M ^a   Kappl, H ^a   Sandu, C S ^b  

^a Depart of Electrochemistry Research Institute for Precious Metals and Metal Chemistry Fem   (Germany)

^b EPFL   (Switzerland)

Author keywords

Hardness; Magnetron sputtering; Microstructure; Niobium oxynitride; PVD; Reactive gas pulsing process

Indexed keywords

CRYSTAL MICROSTRUCTURE; ELASTIC MODULI; HARDNESS; INDENTATION; MAGNETRON SPUTTERING; MULTILAYER FILMS; PHYSICAL VAPOR DEPOSITION; THIN FILMS;

DC MAGNETRON SPUTTERING; REACTIVE GAS PULSING PROCESS;

NIOBIUM ALLOYS;

CRYSTAL MICROSTRUCTURE; ELASTIC MODULI; HARDNESS; INDENTATION; MAGNETRON SPUTTERING; MULTILAYER FILMS; NIOBIUM ALLOYS; PHYSICAL VAPOR DEPOSITION; THIN FILMS;

EID: 38949203051     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.08.007     Document Type: Article

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