Target poisoning during reactive magnetron sputtering: Part I: The influence of ion implantation

Surface and Coatings Technology

Volumn 183, Issue 2-3, 2004, Pages 184-189

  Depla, D ^a   De Gryse, R ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

Modelling; Reactive; Sputtering magnetron; Target poisoning

Indexed keywords

ELECTRIC POTENTIAL; ION IMPLANTATION; MATHEMATICAL MODELS; NITROGEN; SURFACE REACTIONS;

SURFACE RECESSION SPEED; TARGET POISONING;

MAGNETRON SPUTTERING;

COATING;

EID: 2442603468     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.10.006     Document Type: Article

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