Hot target sputtering: A new way for high-rate deposition of stoichiometric ceramic films

Surface and Coatings Technology

Volumn 201, Issue 6, 2006, Pages 2276-2281

  Mercs, D ^a   Perry, F ^a   Billard, A ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

Reactive sputtering; Target temperature; Titanium dioxide; Titanium nitride

Indexed keywords

DIFFUSION; SPUTTER DEPOSITION; STOICHIOMETRY; TEMPERATURE; TITANIUM DIOXIDE; TITANIUM NITRIDE;

ARGON-NITROGEN DISCHARGE; ARGON-OXYGEN MIXTURES; CERAMIC FILMS; COLD TARGET SPUTTERING (CTS); HOT TARGET SPUTTERING (HTS);

CERAMIC MATERIALS;

CERAMIC MATERIALS; DIFFUSION; SPUTTER DEPOSITION; STOICHIOMETRY; TEMPERATURE; TITANIUM DIOXIDE; TITANIUM NITRIDE;

EID: 33751038566     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.03.035     Document Type: Article

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