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Volumn 201, Issue 18, 2007, Pages 7733-7738

Reactive sputtering of TiOxNy coatings by the reactive gas pulsing process: Part III: The particular case of exponential pulses

Author keywords

Exponential pulses; Reactive gas pulsing process (RGPP); Reactive sputtering; Titanium oxynitride

Indexed keywords

DEPOSITION; FLOW RATE; MAGNETRON SPUTTERING; REACTIVE SPUTTERING; TITANIUM COMPOUNDS;

EID: 34249063078     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.03.022     Document Type: Article
Times cited : (21)

References (19)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.