![]() |
Volumn 201, Issue 18, 2007, Pages 7733-7738
|
Reactive sputtering of TiOxNy coatings by the reactive gas pulsing process: Part III: The particular case of exponential pulses
|
Author keywords
Exponential pulses; Reactive gas pulsing process (RGPP); Reactive sputtering; Titanium oxynitride
|
Indexed keywords
DEPOSITION;
FLOW RATE;
MAGNETRON SPUTTERING;
REACTIVE SPUTTERING;
TITANIUM COMPOUNDS;
DUTY CYCLE;
EXPONENTIAL PULSES;
MASS FLOW RATE;
REACTIVE GAS PULSING PROCESS;
TITANIUM OXYNITRIDE;
INORGANIC COATINGS;
DEPOSITION;
FLOW RATE;
INORGANIC COATINGS;
MAGNETRON SPUTTERING;
REACTIVE SPUTTERING;
TITANIUM COMPOUNDS;
|
EID: 34249063078
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2007.03.022 Document Type: Article |
Times cited : (21)
|
References (19)
|