Radical-controlled plasma processing for nanofabrication

Journal of Physics D: Applied Physics

Volumn 44, Issue 17, 2011, Pages

  Hori, Masaru ^a   Kondo, Hiroki ^a   Hiramatsu, Mineo ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b MEIJO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSOLUTE DENSITY; CARBON NANOWALLS; CHEMICAL ETCHING; DENSITY RATIO; HYDROGEN ATOMS; NANO SCALE; NANOFABRICATION; NANOFABRICATION PROCESS; ORGANIC LOW-K; PLASMA PROCESSING; PRECISE CONTROL; PROCESSING PLASMA; PROTECTION LAYERS; RADICAL DENSITIES; RADICAL INJECTION; REACTION FIELDS; REACTIVE PLASMAS; REACTIVE SPECIES; SELF-ORGANIZED; SIMULTANEOUS IRRADIATION; VERTICAL GROWTH;

ETCHING; GRAPHENE; IMPACT IONIZATION; ION BOMBARDMENT; IONS; NANOTECHNOLOGY; PLASMA DEVICES; PLASMAS; POLYMER BLENDS; REACTION KINETICS;

PLASMA DEPOSITION;

EID: 79954606780     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/44/17/174027     Document Type: Article

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