C2 column densities in H2/Ar/CH4 microwave plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 1, 1998, Pages 337-340

  Goyette, A N ^a   Matsuda, Y ^b   Anderson, L W ^a   Lawler, J E ^a  

^a University of Wisconsin Madison   (United States)

^b NAGASAKI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032327430     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580992     Document Type: Article

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