High-sensitivity absorption spectroscopy on a microwave plasma-assisted chemical vapour deposition diamond growth facility

Plasma Sources Science and Technology

Volumn 5, Issue 4, 1996, Pages 761-764

  Erickson, C J ^a   Jameson, W B ^b   Watts Cain, J ^b   Menningen, K L ^c   Childs, M A ^d   Anderson, L W ^b   Lawler, J E ^b  

^a PRINCETON UNIVERSITY   (United States)

^b University of Wisconsin Madison ^*  (United States)

^c UNIVERSITY OF WISCONSIN WHITEWATER   (United States)

^d University of Colorado   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMONDS; EPITAXIAL GROWTH; FILMS; MICROWAVES; PLASMAS; SPECTROSCOPY; VAPOR PHASE EPITAXY;

MULTI-ELEMENT DETECTOR;

PLASMA APPLICATIONS;

EID: 0030282070     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/5/4/019     Document Type: Article

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