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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1747-1751

Low-[formula omitted] materials etching in magnetic neutral loop discharge plasma

(5) Morikawa, Y a Yasunami, S a Chen, W a Hayashi, T a Uchida, T a

a ULVAC INC (Japan)

Author keywords

SiO2

Indexed keywords

EID: 85024773994 PISSN: 07342101 EISSN: 15208559 Source Type: Journal
DOI: 10.1116/1.1355362 Document Type: Conference Paper

Times cited : (51)

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