Electrical conduction control of carbon nanowalls

Applied Physics Letters

Volumn 92, Issue 21, 2008, Pages

  Takeuchi, Wakana ^a   Ura, Masato ^a   Hiramatsu, Mineo ^b   Tokuda, Yutaka ^c   Kano, Hiroyuki ^d   Hori, Masaru ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b MEIJO UNIVERSITY   (Japan)

^c AICHI INSTITUTE OF TECHNOLOGY   (Japan)

^d NU EcoEngineering Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; FLOW RATE; GROWTH RATE; HALL MOBILITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES;

CARBON NANOWALLS (CNW); HALL MEASUREMENT; HYDROGEN PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; NITROGEN INCLUSIONS;

CARBON NANOTUBES;

EID: 44449091653     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2936850     Document Type: Article

References (16)

1. K. S. Novoselov, A. K. Geim, S. V. Morozov, D. Jiang, Y. Zhang, S. V. Dubonos, I. V. Grigorieva, and A. A. Firsov, Science 306, 666 (2004).
2. K. Nakada, M. Fujita, D. Dresselhaus, and M. S. Dresselhaus, Phys. Rev. B 54, 17954 (1996).
3. T. Fang, A. Konar, H. Xing, and D. Jena, Appl. Phys. Lett. 91, 092109 (2007).
4. J. Robertson and C. A. Davis, Diamond Relat. Mater. 4, 441 (1995).
5. I. Shimoyama, G. Wu, T. Sekiguchi, and Y. J. Baba, Phys. Rev. B 62, R6053 (2000).
6. Y. H. Wu, B. J. Yang, B. Y. Zong, H. Sun, Z. X. Shen, and Y. P. Feng, J. Mater. Chem. 14, 469 (2004).
7. J. J. Wang, M. Y. Zhu, R. A. Outlaw, X. Zhao, D. M. Manos, B. C. Holloway, and V. P. Mammana, Appl. Phys. Lett. 85, 1265 (2004).
8. M. Hiramatsu, K. Shiji, H. Amano, and M. Hori, Appl. Phys. Lett. 84, 4708 (2004).
9. M. Hiramatsu and M. Hori, Jpn. J. Appl. Phys., Part 1 45, 5522 (2006).
10. S. Kondo, K. Yamakawa, S. Den, H. Kano, M. Hiramatsu, and M. Hori, Proceeding of the Sixth International Conference on Reactive Plasma 2006 (unpublished), p. 537.
11. Z. H. Ni, H. M. Fan, Y. P. Feng, Z. X. Shen, B. J. Yang, and Y. H. Wu, J. Chem. Phys. 124, 204703 (2006).
12. K. Tanaka, M. Yoshida, A. Okamoto, and K. Ueda, Jpn. J. Appl. Phys., Part 1 44, 2074 (2005).
13. A. T. H. Chuang, B. O. Boskovic, and J. Robertson, Diamond Relat. Mater. 15, 1103 (2006).
14. S. Kurita, A. Yoshimura, H. Kawamoto, T. Uchida, K. Kojima, M. Tachibana, P. Molina-Morales, and H. Nakai, J. Appl. Phys. 97, 104320 (2005).
15. G. Sato, T. Morio, T. Kato, and R. Hatakeyama, Jpn. J. Appl. Phys., Part 1 45, 5210 (2006).
16. L. J. Van der Pauw, Philips Tech. Rev. 20, 220 (1958).