Highly reliable growth process of carbon nanowalls using radical injection plasma-enhanced chemical vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 4, 2008, Pages 1294-1300

  Kondo, Shingo ^a   Hori, Masaru ^a   Yamakawa, Koji ^b   Den, Shoji ^b   Kano, Hiroyuki ^c   Hiramatsu, Mineo ^d  

^a NAGOYA UNIVERSITY   (Japan)

^b Katagiri Engineering Co Ltd   (Japan)

^c NU Eco Engineering Co Ltd   (Japan)

^d MEIJO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC SPECTROSCOPY; CARBON; ECOLOGY; EMISSION SPECTROSCOPY; EPITAXIAL GROWTH; HYDROGEN; MOLECULAR SPECTROSCOPY; NONMETALS; OPTICAL CORRELATION; OPTICAL DESIGN; OPTICAL EMISSION SPECTROSCOPY; PASSIVATION; PLASMA DEPOSITION; PLASMA STABILITY; PLASMAS; SILICON; TWO DIMENSIONAL; VAPORS; WALLS (STRUCTURAL PARTITIONS);

CARBON NANO-STRUCTURES; CARBON NANOWALLS; CHAMBER WALLS; GROWTH PROCESSES; HIGH REPRODUCIBILITY; HIGH STABILITY; OPTIMUM CONDITIONS; PLASMA CHAMBER; PRE-DEPOSITION; RADICAL INJECTION; REPRODUCIBILITY; SI SUBSTRATE; STEADY CONDITIONS; SURFACE CONDITIONING;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 49749092135     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2938397     Document Type: Article

References (16)

1. A. G. Rinzler, J. H. Hafner, P. Nikolaev, L. Lou, S. G. Kim, D. Tomanek, P. Nordlander, D. T. Colbert, and R. E. Smalley, Science 269, 1550 (1995).
2. A. C. Dillon, K. M. Jones, T. A. Bekkedahl, C. H. Kiang, D. S. Bethune, and M. J. Heben, Nature (London) 386, 377 (1997).
3. G. Che, B. B. Lakshmi, E. R. Fisher, and C. R. Martin, Nature (London) 393, 346 (1998).
4. Y. H. Wu, P. W. Qiao, T. C. Chong, and Z. X. Shen, Adv. Mater. (Weinheim, Ger.) 14, 64 (2002).
5. J. J. Wang, M. Y. Zhu, R. A. Outlaw, X. Zhao, D. M. Manos, B. C. Holloway, and V. P. Mammana, Appl. Phys. Lett. 85, 1265 (2004).
6. N. G. Shang, F. C. K. Au, X. M. Meng, C. S. Lee, I. Bello, and S. T. Lee, Chem. Phys. Lett. 358, 187 (2002).
7. M. Hiramatsu, K. Shiji, H. Amano, and M. Hori, Appl. Phys. Lett. 84, 4708 (2004).
8. K. Shiji, M. Hiramatsu, A. Enomoto, M. Nakamura, H. Amano, and M. Hori, Diamond Relat. Mater. 14, 831 (2005).
9. D. Ochs and B. Cord, Appl. Phys. A: Mater. Sci. Process. 78, 637 (2004).
10. H. Singh, J. W. Coburn, and D. B. Graves, J. Vac. Sci. Technol. A 18, 2680 (2000).
11. K. Sasaki and M. Okamoto, Thin Solid Films 506-507, 705 (2006).
12. M. Hiramatsu and M. Hori, Jpn. J. Appl. Phys., Part 1 45, 5522 (2006).
13. H. Toyoda, M. Ito, and H. Sugai, Jpn. J. Appl. Phys., Part 1 36, 3730 (1997).
14. R. d'Agostino, F. Cramarossa, V. Colaprico, and R. d'Ettole, J. Appl. Phys. 54, 1284 (1983).
15. M. Y. Zhu, J. J. Wang, R. A. Outlaw, K. Hou, D. M. Manos, and B. C. Holloway, Diamond Relat. Mater. 16, 196 (2007).
16. M. Y. Zhu, J. J. Wang, B. C. Holloway, R. A. Outlaw, X. Zhao, K. Hou, V. Shutthanandan, and D. M. Manos, Carbon 45, 2229 (2007).