Surfactant-driven self-organized surface patterns by ion beam erosion

New Journal of Physics

Volumn 13, Issue , 2011, Pages

  Zhang, Kun ^a   Brötzmann, Marc ^a   Hofsäss, Hans ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CONTINUOUS DEPOSITION; DOT FORMATIONS; FLAT SURFACES; ION BEAM EROSION; ION FLUENCES; NORMAL INCIDENCE; PATTERN FORMATION; PATTERN ORIENTATION; RIPPLE FORMATION; SELF-ORGANIZED; SI LAYER; SI SUBSTRATES; SI SURFACES; SPUTTER YIELDS; STATE COVERAGE; SURFACE PATTERN; SURFACE REGION;

EROSION; ION BEAMS; PHASE SEPARATION; SILICON; SPUTTERING; SURFACE ACTIVE AGENTS; XENON;

IONS;

EID: 79251589926     PISSN: 13672630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1367-2630/13/1/013033     Document Type: Article

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