Nanostructured carbide surfaces prepared by surfactant sputtering

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 267, Issue 8-9, 2009, Pages 1398-1402

  Hofsass H ^a   Zhang, K ^a   Zutz, H ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

Metal carbide; Ripples; Sputtering; Surfactant; Thin films

Indexed keywords

ANGLE OF INCIDENCES; ATOM DEPOSITIONS; CARBIDE SURFACES; CARBON NANOCOMPOSITES; CONTINUOUS DEPOSITIONS; FOREIGN ATOMS; ION BEAM EROSIONS; ION IRRADIATIONS; MACROSCOPIC LENGTHS; METAL CARBIDE; NANO-METER SCALE; NANO-STRUCTURED; NANOSTRUCTURED SURFACE LAYERS; NOVEL SURFACES; NOVEL TECHNIQUES; RIPPLES; SPUTTER EROSIONS; SPUTTERING TECHNIQUES; SPUTTERING YIELDS; STEADY STATE; SUBSTRATE SURFACES; SURFACE LAYERS; SURFACTANT; TA-C FILMS; TETRAHEDRAL AMORPHOUS CARBON (TAC) FILM; ULTRA-THIN COMPOUNDS;

AMORPHOUS CARBON; AMORPHOUS FILMS; ATOMS; CARBON FILMS; ENGINEERING GEOLOGY; EROSION; FILM PREPARATION; IONS; NANOCOMPOSITES; NANOSTRUCTURES; SPUTTERING; SURFACE ACTIVE AGENTS; THIN FILMS; TITANIUM; TITANIUM CARBIDE; TUNGSTEN; TUNGSTEN CARBIDE; XENON;

SURFACE TOPOGRAPHY;

EID: 65249091518     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2009.01.053     Document Type: Article

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