Structural, magnetic and electrical properties of Fe/Si system

Materials Science in Semiconductor Processing

Volumn 11, Issue 1, 2008, Pages 1-5

  Lal, Chhagan ^a   Dhunna, Renu ^a   Jain, I P ^a  

^a UNIVERSITY OF RAJASTHAN   (India)

Author keywords

Electron beam evaporation; GIXRD; MOKE; Silicide

Indexed keywords

AMORPHOUS FILMS; ELECTRIC PROPERTIES; ELECTRON BEAMS; ELECTRON GUNS; EVAPORATION; MICROELECTRONICS; MOISTURE; PARTICLE BEAMS; PHASE INTERFACES; SEMICONDUCTING SILICON COMPOUNDS; SILICIDES; THERMOCHEMISTRY; VACUUM EVAPORATION; VAPORS;

A STABLES; ANNEALED SAMPLES; ANNEALING TEMPERATURES; BARRIER HEIGHT VALUES; COERCIVITY; DISILICIDES; ELECTRON BEAM EVAPORATION; GIXRD; HEAT OF FORMATIONS; HYSTERESIS CURVES; MAGNETIC AND ELECTRICAL PROPERTIES; MOKE; SCHOTTKY BARRIER HEIGHTS; SILICIDE PHASES; TECHNOLOGICAL APPLICATIONS;

SCHOTTKY BARRIER DIODES;

EID: 58149231278     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2008.04.004     Document Type: Article

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