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Journal of Applied Physics

Volumn 106, Issue 9, 2009, Pages

Self-sustained etch masking: A general concept to initiate the formation of nanopatterns during ion erosion

(5) Le Roy, S a Barthel, E a Brun, N b Lelarge, A a Sondergrd E a

a SAINT GOBAIN RECHERCHE (France)

b UNIVERSITÉ PARIS SUD (France)

Author keywords

[No Author keywords available]

Indexed keywords

BOTTOM UP APPROACH; BRADLEY-HARPER MODELS; COMPOUND MATERIAL; FORMATION MECHANISM; HIGH RESOLUTION; II-IV SEMICONDUCTORS; ION EROSION; NANO PATTERN; NANOPATTERNED SURFACES; PATTERN FORMATION; RELIABLE FORMATIONS; SELF-ORGANIZED; SHOW THROUGH; STRUCTURE TYPE; TRANSMISSION ELECTRON; X-RAY PHOTO;

PHASE DIAGRAMS;

IONS;

EID: 70450278651 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3243333 Document Type: Article

Times cited : (54)

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