Formation of large-area nanostructures on Si and Ge surfaces during low energy ion beam erosion

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 4, 2006, Pages 1344-1348

  Ziberi, B ^a   Frost, F ^a   Rauschenbach, B ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAM LITHOGRAPHY; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; SEMICONDUCTING GERMANIUM; THERMAL DIFFUSION IN SOLIDS;

ION ENERGY; ION INCIDENCE ANGLE; LOW ENERGY ION BEAM EROSION; RIPPLE FORMATION; ROOM TEMPERATURE;

SEMICONDUCTING SILICON;

EID: 33745484784     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2188415     Document Type: Article

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