Resputtering effects during ion beam assisted deposition and the sputter yield amplification effect

Surface and Coatings Technology

Volumn 84, Issue 1-3, 1996, Pages 353-362

  Berg, Sören ^a   Katardjiev, Ilia ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

Computer simulation; Enhanced sputtering; Ion assisted deposition; Preferential sputtering

Indexed keywords

COMPUTER SIMULATION; DEPOSITION; IMPURITIES; ION BEAMS; MATHEMATICAL MODELS; ULTRATHIN FILMS;

ENHANCED SPUTTERING; ION BEAM ASSISTED DEPOSITION; SPUTTER YIELD AMPLIFICATION;

SPUTTERING;

EID: 0030270774     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(95)02762-9     Document Type: Article

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