Nanoscale metal-silicide films prepared by surfactant sputtering and analyzed by RBS

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 268, Issue 11-12, 2010, Pages 1967-1971

  Zhang, K ^a   Hofsass H ^a   Zutz, H ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

Ion beam erosion; Metal silicide; Surface smoothing; Surfactant; Thin films

Indexed keywords

ATOM DEPOSITION; BACKSCATTERING SPECTROSCOPY; DEPTH DISTRIBUTION; FLUENCES; HIGH-RESOLUTION RBS; INCIDENT ANGLES; ION BEAM EROSION; ION IRRADIATION; METAL COVERAGES; NANO-METER SCALE; NANOSCALE METALS; RELIEF PATTERNS; SI SUBSTRATES; SI(1 0 0); SILICIDE FILMS; SILICIDE SURFACES; SMOOTH SURFACE; SPUTTER EROSION; SPUTTER YIELDS; STEADY STATE; SURFACE NANOSTRUCTURE; SURFACE SMOOTHING; ULTRA-THIN;

ATOMIC FORCE MICROSCOPY; ATOMS; BEAM PLASMA INTERACTIONS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; ION BEAMS; ION BOMBARDMENT; IONS; METALS; NICKEL ALLOYS; PLATINUM; SCANNING ELECTRON MICROSCOPY; SILICIDES; SILICON; SPUTTERING; SUBSTRATES; SURFACE ACTIVE AGENTS; SURFACE TOPOGRAPHY; ULTRATHIN FILMS; XENON;

CRYSTAL ATOMIC STRUCTURE;

EID: 77953169079     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2010.02.110     Document Type: Article

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