Atomic layer deposition and characterization of erbium oxide-doped zirconium oxide thin films

Journal of the Electrochemical Society

Volumn 157, Issue 10, 2010, Pages

  Tamm, Aile ^a   Kemell, Marianna ^b   Kozlova, Jekaterina ^a   Sajavaara, Timo ^c   Tallarida, Massimo ^d   Kukli, Kaupo ^a,b   Sammelselg, Väino ^a   Ritala, Mikko ^b   Leskelä, Markku ^b  

^a UNIVERSITY OF TARTU   (Estonia)

^b UNIVERSITY OF HELSINKI   (Finland)

^c UNIVERSITY OF JYVÄSKYLÄ   (Finland)

^d BRANDENBURG UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AS-DEPOSITED STATE; EQUIVALENT OXIDE THICKNESS; ERBIUM OXIDE; NON-DOPED; TETRAGONAL POLYMORPHS; TETRAMETHYL; ZIRCONIUM OXIDE;

ATOMIC LAYER DEPOSITION; CAPACITANCE; DEPOSITION; ERBIUM; OZONE; ZIRCONIA; ZIRCONIUM; ZIRCONIUM ALLOYS;

OXIDE FILMS;

EID: 77956198125     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3467843     Document Type: Article

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