Structural and electrical characterization of ALCVD ZrO2 thin films on silicon

Journal of Non-Crystalline Solids

Volumn 303, Issue 1, 2002, Pages 29-34

  Ferrari, S ^a   Dekadjevi, D T ^a   Spiga, S ^a   Tallarida, G ^a   Wiemer, C ^a   Fanciulli, M ^a  

^a LABORATORIO MDM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; FILM GROWTH; GATES (TRANSISTOR); POLYCRYSTALLINE MATERIALS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON; X RAY DIFFRACTION; ZIRCONIUM COMPOUNDS;

ATOMIC LAYER CHEMICAL VAPOR DEPOSITION (ALCVD); X-RAY REFLECTIVITY;

THIN FILMS;

EID: 0036567799     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(02)00960-2     Document Type: Article

References (10)