-
1
-
-
0034187380
-
-
JVTBD9 1071-1023 10.1116/1.591472
-
J. Robertson, J. Vac. Sci. Technol. B JVTBD9 1071-1023 10.1116/1.591472 18, 1785 (2000).
-
(2000)
J. Vac. Sci. Technol. B
, vol.18
, pp. 1785
-
-
Robertson, J.1
-
3
-
-
49649111791
-
-
This band diagram is not exact for several reasons. The vacuum level represented here is meaningful only for the high- κ material. We are also assuming that the bands are flat across the materials.
-
This band diagram is not exact for several reasons. The vacuum level represented here is meaningful only for the high- κ material. We are also assuming that the bands are flat across the materials.
-
-
-
-
4
-
-
0043095205
-
-
SUSCAS 0039-6028 10.1016/S0039-6028(96)01127-2
-
D. Arena, F. Curti, and R. Bartynski, Surf. Sci. SUSCAS 0039-6028 10.1016/S0039-6028(96)01127-2 369, L117 (1996).
-
(1996)
Surf. Sci.
, vol.369
, pp. 117
-
-
Arena, D.1
Curti, F.2
Bartynski, R.3
-
5
-
-
84861134776
-
-
ZZZZZZ 0894-0886
-
E. Vescovo, H.-J. Kim, Q.-Y. Dong, G. Nintzel, D. Carlson, S. Hulbert, and N. V. Smith, Synchrotron Radiat. News ZZZZZZ 0894-0886 12, 10 (1999).
-
(1999)
Synchrotron Radiat. News
, vol.12
, pp. 10
-
-
Vescovo, E.1
Kim, H.-J.2
Dong, Q.-Y.3
Nintzel, G.4
Carlson, D.5
Hulbert, S.6
Smith, N.V.7
-
6
-
-
0036573608
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.65.174117
-
A. S. Foster, F. Lopez Gejo, A. L. Shluger, and R. M. Nieminen, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.65.174117 65, 174117 (2002).
-
(2002)
Phys. Rev. B
, vol.65
, pp. 174117
-
-
Foster, A.S.1
Lopez Gejo, F.2
Shluger, A.L.3
Nieminen, R.M.4
-
8
-
-
4243873396
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.44.3133
-
R. Hofmann, W. A. Henle, and F. P. Netzer, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.44.3133 44, 3133 (1991).
-
(1991)
Phys. Rev. B
, vol.44
, pp. 3133
-
-
Hofmann, R.1
Henle, W.A.2
Netzer, F.P.3
-
10
-
-
0006973819
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.32.8278
-
R. P. Gupta, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.32.8278 32, 8278 (1985).
-
(1985)
Phys. Rev. B
, vol.32
, pp. 8278
-
-
Gupta, R.P.1
-
11
-
-
0035519201
-
-
JVTBD9 1071-1023 10.1116/1.1418405
-
S. Miyazaki, J. Vac. Sci. Technol. B JVTBD9 1071-1023 10.1116/1.1418405 19, 2212 (2001).
-
(2001)
J. Vac. Sci. Technol. B
, vol.19
, pp. 2212
-
-
Miyazaki, S.1
-
12
-
-
22644448699
-
-
JVTBD9 1071-1023 10.1116/1.590834
-
J. Keister, J. Rowe, J. Kolodziej, H. Niimi, and T. Madey, J. Vac. Sci. Technol. B JVTBD9 1071-1023 10.1116/1.590834 17, 1831 (1999).
-
(1999)
J. Vac. Sci. Technol. B
, vol.17
, pp. 1831
-
-
Keister, J.1
Rowe, J.2
Kolodziej, J.3
Niimi, H.4
Madey, T.5
-
15
-
-
0035498692
-
-
MIENEF 0167-9317 10.1016/S0167-9317(01)00654-2
-
V. Afanas'ev, M. Houssa, A. Stesmans, G. Adriaenssens, and M. Heyns, Microelectron. Eng. MIENEF 0167-9317 10.1016/S0167-9317(01)00654-2 59, 335 (2001).
-
(2001)
Microelectron. Eng.
, vol.59
, pp. 335
-
-
Afanas'Ev, V.1
Houssa, M.2
Stesmans, A.3
Adriaenssens, G.4
Heyns, M.5
-
16
-
-
29844452008
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.72.205117
-
G. L. Tan, M. F. Lemon, D. J. Jones, and R. H. French, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.72.205117 72, 205117 (2005).
-
(2005)
Phys. Rev. B
, vol.72
, pp. 205117
-
-
Tan, G.L.1
Lemon, M.F.2
Jones, D.J.3
French, R.H.4
-
17
-
-
0141569714
-
-
JVTBD9 1071-1023 10.1116/1.1589518
-
M. Ulrich, J. G. Hong, J. E. Rowe, G. Lucovsky, A.-Y. Chan, and T. E. Madey, J. Vac. Sci. Technol. B JVTBD9 1071-1023 10.1116/1.1589518 21, 1777 (2003).
-
(2003)
J. Vac. Sci. Technol. B
, vol.21
, pp. 1777
-
-
Ulrich, M.1
Hong, J.G.2
Rowe, J.E.3
Lucovsky, G.4
Chan, A.-Y.5
Madey, T.E.6
-
19
-
-
79955987885
-
-
APPLAB 0003-6951 10.1063/1.1492024
-
H. Y. Yu, M. F. Li, B. J. Cho, C. C. Yeo, M. S. Joo, D.-L. Kwong, J. S. Pan, C. H. Ang, J. Z. Zheng, and S. Ramanathan, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1492024 81, 376 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.81
, pp. 376
-
-
Yu, H.Y.1
Li, M.F.2
Cho, B.J.3
Yeo, C.C.4
Joo, M.S.5
Kwong, D.-L.6
Pan, J.S.7
Ang, C.H.8
Zheng, J.Z.9
Ramanathan, S.10
-
20
-
-
19944362147
-
-
JAPIAU 0021-8979 10.1063/1.1803107
-
S. Sayan, T. Emge, E. Garfunkel, X. Zhao, L. Wielunski, R. Bartynski, D. Vanderbilt, J. Suehle, S. Suzer, and M. Banaszak-Holl, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1803107 96, 7485 (2004).
-
(2004)
J. Appl. Phys.
, vol.96
, pp. 7485
-
-
Sayan, S.1
Emge, T.2
Garfunkel, E.3
Zhao, X.4
Wielunski, L.5
Bartynski, R.6
Vanderbilt, D.7
Suehle, J.8
Suzer, S.9
Banaszak-Holl, M.10
-
21
-
-
2942570078
-
-
0368-2048
-
S. Toyoda, J. Okabayashi, H. Kumigashira, M. Oshima, K. Ono, M. Niwa, K. Usuda, and N. Hirashita, J. Electron Spectrosc. Relat. Phenom. 137-140, 141 (2004). 0368-2048
-
(2004)
J. Electron Spectrosc. Relat. Phenom.
, vol.137-140
, pp. 141
-
-
Toyoda, S.1
Okabayashi, J.2
Kumigashira, H.3
Oshima, M.4
Ono, K.5
Niwa, M.6
Usuda, K.7
Hirashita, N.8
-
23
-
-
79956051787
-
-
APPLAB 0003-6951 10.1063/1.1495088
-
V. V. Afanas'ev, A. Stesmans, F. Chen, X. Shi, and S. A. Campbell, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1495088 81, 1053 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.81
, pp. 1053
-
-
Afanas'Ev, V.V.1
Stesmans, A.2
Chen, F.3
Shi, X.4
Campbell, S.A.5
-
24
-
-
4944237526
-
-
JVTBD9 1071-1023 10.1116/1.1771670
-
G. Lucovsky, J. Hong, C. Fulton, Y. Zou, R. Nemanich, and H. Ade, J. Vac. Sci. Technol. B JVTBD9 1071-1023 10.1116/1.1771670 22, 2132 (2004).
-
(2004)
J. Vac. Sci. Technol. B
, vol.22
, pp. 2132
-
-
Lucovsky, G.1
Hong, J.2
Fulton, C.3
Zou, Y.4
Nemanich, R.5
Ade, H.6
-
25
-
-
0041339893
-
-
JAPIAU 0021-8979 10.1063/1.1580642
-
N. Ikarashi and K. Manabe, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1580642 94, 480 (2003).
-
(2003)
J. Appl. Phys.
, vol.94
, pp. 480
-
-
Ikarashi, N.1
Manabe, K.2
-
26
-
-
0036863349
-
-
EDLEDZ 0741-3106 10.1109/LED.2002.805000
-
W. Zhu, T. Tamagawa, M. Gibson, T. Furakawa, and T. Ma, IEEE Electron Device Lett. EDLEDZ 0741-3106 10.1109/LED.2002.805000 23, 649 (2002).
-
(2002)
IEEE Electron Device Lett.
, vol.23
, pp. 649
-
-
Zhu, W.1
Tamagawa, T.2
Gibson, M.3
Furakawa, T.4
Ma, T.5
-
27
-
-
31044438318
-
-
JVTAD6 0734-2101 10.1116/1.2091096
-
N. V. Nguyen, S. Sayan, I. Levin, J. R. Ehrstein, I. J. R. Baumvol, C. Driemeier, C. Krug, L. Wielunski, P. Y. Hung, and A. Diebold, J. Vac. Sci. Technol. A JVTAD6 0734-2101 10.1116/1.2091096 23, 1706 (2005).
-
(2005)
J. Vac. Sci. Technol. A
, vol.23
, pp. 1706
-
-
Nguyen, N.V.1
Sayan, S.2
Levin, I.3
Ehrstein, J.R.4
Baumvol, I.J.R.5
Driemeier, C.6
Krug, C.7
Wielunski, L.8
Hung, P.Y.9
Diebold, A.10
-
28
-
-
4644357044
-
-
PSSBBD 0370-1972 10.1002/pssb.200404945
-
S. Sayan, R. Bartynski, X. Zhao, E. Gusev, D. Vanderbilt, M. Croft, H. Banaszak Holl, and E. Garfunkel, Phys. Status Solidi B PSSBBD 0370-1972 10.1002/pssb.200404945 241, 2246 (2004).
-
(2004)
Phys. Status Solidi B
, vol.241
, pp. 2246
-
-
Sayan, S.1
Bartynski, R.2
Zhao, X.3
Gusev, E.4
Vanderbilt, D.5
Croft, M.6
Banaszak Holl, H.7
Garfunkel, E.8
-
29
-
-
31044455312
-
-
RPPHAG 0034-4885 10.1088/0034-4885/69/2/R02
-
J. Robertson, Rep. Prog. Phys. RPPHAG 0034-4885 10.1088/0034-4885/69/2/ R02 69, 327 (2006).
-
(2006)
Rep. Prog. Phys.
, vol.69
, pp. 327
-
-
Robertson, J.1
-
31
-
-
0036567767
-
-
JNCSBJ 0022-3093 10.1016/S0022-3093(02)00970-5
-
H. Nohira, W. Tsai, W. Besling, E. Young, J. Petry, T. Conard, W. Vandervorst, S. De Gendt, M. Heyns, J. Maes, and M. Tuominen, J. Non-Cryst. Solids JNCSBJ 0022-3093 10.1016/S0022-3093(02)00970-5 303, 83 (2002).
-
(2002)
J. Non-Cryst. Solids
, vol.303
, pp. 83
-
-
Nohira, H.1
Tsai, W.2
Besling, W.3
Young, E.4
Petry, J.5
Conard, T.6
Vandervorst, W.7
De Gendt, S.8
Heyns, M.9
Maes, J.10
Tuominen, M.11
-
32
-
-
33846107462
-
-
MSSPFQ 1369-8001 10.1016/j.mssp.2006.10.019
-
L. Zhu, Q. Fang, G. He, M. Liu, X. Xu, and L. Zhang, Mater. Sci. Semicond. Process. MSSPFQ 1369-8001 10.1016/j.mssp.2006.10.019 9, 1025 (2006).
-
(2006)
Mater. Sci. Semicond. Process.
, vol.9
, pp. 1025
-
-
Zhu, L.1
Fang, Q.2
He, G.3
Liu, M.4
Xu, X.5
Zhang, L.6
-
33
-
-
38849161056
-
-
JAPIAU 0021-8979 10.1063/1.2799091
-
V. V. Afanas'ev and A. Stesmans, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.2799091 102, 081301 (2007).
-
(2007)
J. Appl. Phys.
, vol.102
, pp. 081301
-
-
Afanas'Ev, V.V.1
Stesmans, A.2
-
35
-
-
1642280303
-
-
APPLAB 0003-6951 10.1063/1.1645984
-
J.-C. Lee, S.-J. Oh, M. Cho, C. S. Hwang, and R. Jung, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1645984 84, 1305 (2004).
-
(2004)
Appl. Phys. Lett.
, vol.84
, pp. 1305
-
-
Lee, J.-C.1
Oh, S.-J.2
Cho, M.3
Hwang, C.S.4
Jung, R.5
-
36
-
-
34249041764
-
-
MIENEF 0167-9317 10.1016/j.mee.2007.04.102
-
J. L. Gavartin and A. L. Shluger, Microelectron. Eng. MIENEF 0167-9317 10.1016/j.mee.2007.04.102 84, 2412 (2007).
-
(2007)
Microelectron. Eng.
, vol.84
, pp. 2412
-
-
Gavartin, J.L.1
Shluger, A.L.2
|