Structural and electrical properties of electron beam gun evaporated Er2O3 insulator thin films

Journal of Applied Physics

Volumn 95, Issue 2, 2004, Pages 613-620

  Mikhelashvili, V ^a   Eisenstein, G ^a   Edelman, F ^a   Brener, R ^a   Zakharov, N ^b   Werner, P ^b  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; ELECTRIC INSULATORS; ELECTRIC PROPERTIES; ELECTRON BEAMS; ELECTRON GUNS; ERBIUM COMPOUNDS; EVAPORATION; MORPHOLOGY; MOS DEVICES; NANOSTRUCTURED MATERIALS; STRUCTURE (COMPOSITION); SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CAPACITANCE-VOLTAGE CHARACTERISTICS; GATE DIELECTRICS;

THIN FILMS;

EID: 0742285719     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1633342     Document Type: Article

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