SCOPUS 정보 검색 플랫폼

Volumn 12, Issue 1, 2002, Pages 53-57

A positive-working alkaline developable photoresist based on partially tert-Boc-protected calix[4]resorcinarene and a photoacid generator

(5) Young Gil, Kwon a Kim, Jin Baek a Fujigaya, Tsuyohiko b Shibasaki, Yuji b Ueda, Mitsuru b

a Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

b TOKYO INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTHRACENE DERIVATIVE; CALIX[4]RESORCINARENE DERIVATIVE; CALIXARENE; CYCLOHEXANONE; DIPHENYLIODONIUM 9,10 DIMETHOXYANTHRACENE 2 SULFONATE; HYDROXIDE; TETRAMETHYLAMMONIUM; UNCLASSIFIED DRUG;

ADHESION; AQUEOUS SOLUTION; ARTICLE; CHEMICAL REACTION; FILM; LIGHT; MOLECULAR WEIGHT; PHOTOCHEMISTRY; REACTION ANALYSIS; SYNTHESIS; TEMPERATURE; ULTRAVIOLET RADIATION;

EID: 0036147998 PISSN: 09599428 EISSN: None Source Type: Journal
DOI: 10.1039/b106278f Document Type: Article

Times cited : (71)

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