A new photoresist based on calix[4]resorcinarene dendrimer

Chemistry of Materials

Volumn 11, Issue 2, 1999, Pages 427-432

  Haba, Osamu ^a   Haga, Kohji ^a   Ueda, Mitsuru ^a   Morikawa, Osamu ^b   Konishi, Hisatoshi ^b  

^a YAMAGATA UNIVERSITY   (Japan)

^b TOTTORI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001574557     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm980654v     Document Type: Article

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