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Volumn 14, Issue 2, 2001, Pages 275-280
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A new positive working alkaline developable photoresist based on a simple amorphous molecule, tri(3,5-di-tert-butoxycarbonyloxybenzyl) 1,3,5-benzenetricarboxylate and a photoacid generator
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Author keywords
Amorphous molecule; Chemically amplified photoresist; Photoacid generator; Selective acylation
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Indexed keywords
CARBOXYLIC ACID DERIVATIVE;
DIPHENYLIODONIUM 9,10 DIMETHOXYANTHRACENE 2 SULFONATE;
DIPHENYLIODONIUM SALT;
POLYMER;
SILICON;
SULFONIC ACID DERIVATIVE;
TRI(3,5 DI TERT BUTOXYCARBONYL)BENZYL 1,3,5 BENZENETRICARBOXYLATE;
UNCLASSIFIED DRUG;
ACYLATION;
ARTICLE;
CHEMICAL ANALYSIS;
DISSOLUTION;
FILM;
IMAGING SYSTEM;
MOLECULAR DYNAMICS;
PHOTOSENSITIZATION;
PROTON NUCLEAR MAGNETIC RESONANCE;
REACTION ANALYSIS;
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EID: 0035746854
PISSN: 09149244
EISSN: None
Source Type: Journal
DOI: 10.2494/photopolymer.14.275 Document Type: Article |
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Times cited : (13)
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References (25)
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