A negative-working alkaline developable photoresist based on calix[4]resorcinarene, a cross-linker, and a photoacid generator

Chemistry Letters

Volumn , Issue 3, 1997, Pages 265-266

  Nakayama, Tomonari ^a   Haga, Kohji ^a   Haba, Osamu ^a   Ueda, Mitsuru ^a  

^a YAMAGATA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001359386     PISSN: 03667022     EISSN: None     Source Type: Journal    
DOI: 10.1246/cl.1997.265     Document Type: Article

References (7)

1. C.G. Willson, in "Introduction to Microlithography, 2nd ed.", ed by L. F. Thompson, C. G. Willson, and M. J. Bowden, ACS, Washington (1994), p.139.
2. R. D. Allen, K. J. Rex Chen, and P. M. Gallagher-Wetmore, Proc. SPIE, 2438, 250 (1995).
3. C. D. Gutsche, Aldrichimica Acta, 28, 3 (1995).
4. J. Fujita, Y. Ohnishi, Y. Ochiai, and S. Matsui, Appl.Phys. Lett., 68, 2438, 250 (1995).
5. F. Weiner and H. -J. Schneider, J. Org. Chem., 56, 5527 (1991).
6. M. Ueda and T. Nakayama, Macromolecules, 29, 6427 (1996).
7. A. G. S. Högberg, J. Org. Sci., 45, 4498 (1980).