Calixarene electron beam resist for nano-lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 12 SUPPL. B, 1997, Pages 7769-7772

  Fujita, Jun Ichi ^a   Ohnishi, Yoshitake ^a   Manako, Shoko ^a   Ochiai, Yukinori ^a   Nomura, Eiichi ^a   Sakamoto, Toshitsugu ^a   Matsui, Shiniji ^a,b  

^a NEC CORPORATION   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Calixarene; Electron beam lithography; Nanolithography; Resist

Indexed keywords

AROMATIC COMPOUNDS; NANOTECHNOLOGY;

CALIXARENE RESISTS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0031345711     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.7769     Document Type: Article

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