Novel electron-beam molecular resists with high resolution and high sensitivity for nanometer lithography

Chemistry Letters

Volumn 33, Issue 6, 2004, Pages 706-707

  Kadota, Toshiaki ^a   Kageyama, Hiroshi ^a   Wakaya, Fujio ^a   Gamo, Kenji ^a   Shirota, Yasuhiko ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARTICLE; ELECTRON BEAM; ELECTRONICS; NANOTECHNOLOGY; SYNTHESIS;

EID: 4444331156     PISSN: 03667022     EISSN: None     Source Type: Journal    
DOI: 10.1246/cl.2004.706     Document Type: Article

References (8)

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5. Y. Shirota, J. Mater. Chem., 10, 1 (2000) and references cited therein.
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7. 18: C, 74.06; H, 6.21; O, 19.73. Found: C, 73.96; H, 6.33%.
8. C. G. Willson, H. Ito, J. M. J. Fréchet, T. G. Tessier, and F. M. Houlihan, J. Electrochem. Soc., 133, 181 (1986).