1,3,5-Tris[4-(rerf-butoxycarbonylmethoxy)-phenyl]benzene as a novel electron-beam positive resist for nanometer lithography

Journal of Photopolymer Science and Technology

Volumn 9, Issue 1, 1996, Pages 57-58

  Yoshiiwa, Motoko ^a   Kageyama, Hiroshi ^a   Wakaya, Fujio ^a   Takai, Mikio ^a   Gamo, Kenji ^a   Shirota, Yasuhiko ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001957559     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.9.57     Document Type: Article

References (3)

1. B. H. Zimm and W. H. Stockmayer, J. Chem. Phys., 17 (1949) 1301.
2. J. Fujita, Y. Ohnishi, Y. Ochiai and S. Matsui, Appl. Phys. Lett., 68 (1996) 1297.
3. T. Tada and T. Kanayama, Jpn. J. Appl. Phys., 35 (1996) L63.