Three-component negative-type photoresist based on C-tetraoctyl-calix[4]resocinarene, a cross-linker, and a photo-acid generator

Journal of Photopolymer Science and Technology

Volumn 12, Issue 2, 1999, Pages 347-352

  Nakayama, Tomonari ^a   Takahashi, Daisuke ^a   Takeshi, Kazumasa ^a   Ueda, Mitsuru ^a  

^a YAMAGATA UNIVERSITY   (Japan)

Author keywords

2.38 (w w) TMAH developer; C tetraalkyl calix 4 resorcinarenes; Cross linker; Photoacid generator

Indexed keywords

EID: 0000296009     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.347     Document Type: Article

References (13)

1. Willson, C.G. in "Introduction to Microlithography" ed by L.F.Thompson, Willson, C.G. and Bowden, M.J. 2nd ed, ACS, Washington, 1994, p.139.
2. Allen, R.D.; Rex Chen, K.J.; Gallagher-Wetmore, P.M. Proc. SPIE, 1995, 2438, 250.
3. Böhmer, V, Angew. Chem. Int. Ed. Engl. 1995, 34, 713.
4. Tunstad, L.M.; Tucker, J. A.; Dalcanale, E.; Weiser, J.; Bryant, J. A.; Sherman, J. C.; Helgeson, R. C.; Knobler, C. B.; Cram. D. J. J. Org. Chem. 1989, 54, 1305.
5. Ueda, M., Takahashi, D., Nakayama, T., and Haba, O., Chemistry of Materials, 1998, 10, 2230.
6. Takeda, N.; Ishimaru, E., Jpn. Kokai Tokkyo Koho 1983, JP 58, 116, 433.
7. Omote, T.; Yamaoka, T. Polym. Eng. Sci. 1992, 32, 1634.
8. Högberg, A.G.S. J. Org. Chem. 1980, 45, 4498.
9. Högberg, A.G.S. J. Am. Chem. Soc. 1980, 102, 6046.
10. Nakayama, T., Nomura, M., Haga, K., and Ueda, M., Bull. Chem. Soc. Jpn., 1998, 71, 2979.
11. Shaw, J. M., Gelorme, J. LaBianka, D., N., C. Conley, W. E., and Holmes, S. J., IBM J. Res. Develop., 1997, 41, 81.
12. Lee, S. M.; Fréchet, J. M.; Willson, C. G. Macromolecules, 1994, 27, 5154.
13. Lee, S. M.; Fréchet, J. M. Macromolecules, 1994, 27, 5160.