Nanometer-scale resolution of a chloromethylated calixarene negative resist in electron-beam lithography: Dependence on the number of phenolic residues

Applied Physics Letters

Volumn 77, Issue 2, 2000, Pages 301-303

  Sakamoto, T ^a   Manako, S ^a   Fujita, J ^a   Ochiai, Y ^a   Baba, T ^a   Yamamoto, H ^b   Teshima, T ^c  

^a NEC CORPORATION   (Japan)

^b TOKUYAMA CORPORATION   (Japan)

^c Clariant Tokuyama Limited   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038493787     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.126957     Document Type: Article

References (12)

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