Plasma parameters of pulsed-dc discharges in methane used to deposit diamondlike carbon films

Journal of Applied Physics

Volumn 106, Issue 3, 2009, Pages

  Corbella, C ^a   Rubio Roy, M ^a   Bertran, E ^a   Andujar J L ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ACQUISITION SYSTEMS; ACTIVATION ENERGY E; COLD ELECTRONS; CONVERSION FACTOR; DIAMOND-LIKE CARBON; DIAMOND-LIKE CARBON FILM; DLC FILM; ELECTRICAL DISCHARGES; ELECTRON DISTRIBUTIONS; LOW DENSITY; LOW ENERGIES; NEGATIVE PULSE; NEGATIVE REGIONS; NEGATIVE VOLTAGE; PEAK VOLTAGE; PLASMA CHARACTERISTICS; PLASMA KINETIC; PLASMA PARAMETER; PLASMA POTENTIAL; PLASMA PROCESS; PULSE CYCLE; PULSE WAVEFORMS; PULSED POWER SUPPLY; PULSED-DC DISCHARGE; RADIO FREQUENCY SOURCE; ROOM TEMPERATURE; SHEATH EDGE; STOCHASTIC HEATING; TIME RESOLUTION; TIME-RESOLVED;

ACTIVATION ENERGY; CARBON FILMS; COMPUTER CONTROL SYSTEMS; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; ELECTRIC POWER SUPPLIES TO APPARATUS; ELECTRIC POWER SYSTEMS; ELECTRON TEMPERATURE; ELECTRONS; HARD COATINGS; HOT ELECTRONS; INDUSTRIAL APPLICATIONS; METHANE; PLASMA DEPOSITION; PLASMA DEVICES; PLASMAS; PROTECTIVE COATINGS; SPACE PROBES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 69149090775     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3183945     Document Type: Article

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