Growth precursors for a-C:H film deposition in pulsed inductively coupled methane plasmas

Journal of Applied Physics

Volumn 98, Issue 7, 2005, Pages

  Bauer, M ^a   Schwarz Selinger, T ^a   Jacob, W ^a   Von Keudell, A ^b  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON ATOMS; FILM DEPOSITION; GROWTH RATES; RADICAL FLUXES;

CHEMISORPTION; DEPOSITION; ELLIPSOMETRY; HYDROCARBONS; INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETRY; PLASMA DENSITY; THIN FILMS;

CARBON;

EID: 27144528729     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2061890     Document Type: Article

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