Internal r.f. plasma parameters correlated with structure and properties of deposited hydrocarbon films

Thin Solid Films

Volumn 358, Issue 1, 2000, Pages 30-39

  Hallil, Abdelbasset ^a   Despax, Bernard ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CHEMICAL BONDS; DEPOSITION; ELECTRIC POTENTIAL; ELECTRONIC PROPERTIES; FILM GROWTH; HYDROCARBONS; HYDROGENATION; PARTIAL PRESSURE; PLASMA APPLICATIONS; PRESSURE EFFECTS; PROPANE;

LANGMUIR PROBES; SELF-BIAS VOLTAGE;

AMORPHOUS FILMS;

EID: 0033883728     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00719-1     Document Type: Article

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