Modified DLC coatings prepared in a large-scale reactor by dual microwave/pulsed-DC plasma-activated chemical vapour deposition

Thin Solid Films

Volumn 517, Issue 3, 2008, Pages 1125-1130

  Corbella, C ^a   Bialuch, I ^a   Kleinschmidt, M ^a   Bewilogua, K ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

ECR; Microwaves; Modified DLC; PACVD; Pulsed DC; Up scaling

Indexed keywords

ACETYLENE; CARBON FILMS; CONTACT ANGLE; CYCLOTRONS; DEPOSITION; DEPOSITION RATES; DIAMOND FILMS; DIAMOND LIKE CARBON FILMS; DIAMONDS; ELECTRIC DISCHARGES; ELECTRIC LOAD MANAGEMENT; ELECTRON CYCLOTRON RESONANCE; GLOW DISCHARGES; HARD COATINGS; INDUSTRIAL PLANTS; IONIZATION OF GASES; IONIZATION OF LIQUIDS; LIGHTING; MICROWAVES; MONOMERS; OXYGEN; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; PROTECTIVE COATINGS; SILICON;

ECR; MODIFIED DLC; PACVD; PULSED-DC; UP SCALING;

PLASMA DEPOSITION;

EID: 56649124717     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.07.017     Document Type: Article

References (19)

1. Robertson J. Mater. Sci. Eng. R 37 (2002) 129
2. Bewilogua K., Cooper C.V., Specht C., Schröder J., Wittorf R., and Grischke M. Surf. Coat. Technol. 127 (2000) 224
3. Corbella C., Oncins G., Gómez M.A., Polo M.C., Pascual E., García-Céspedes J., Andújar J.L., and Bertran E. Diamond Relat. Mater. 14 (2005) 1103
4. Nakamatsu K., Yamada N., Kanda K., Haruyama Y., and Matsui S. Jpn. J. Appl. Phys. Lett. 45 (2006) L954
5. Grischke M., Hieke A., Morgenweck F., and Dimigen H. Diamond Relat. Mater. 7 (1998) 454
6. Michler T., Grischke M., Traus I., Bewilogua K., and Dimigen H. Diamond Relat. Mater. 7 (1998) 459
7. Andújar J.L., Vives M., Corbella C., and Bertran E. Diamond Relat. Mater. 12 (2003) 98
8. Petasch W., Räuchle E., Muegge H., and Muegge K. Surf. Coat. Technol. 93 (1997) 112
9. Lacoste A., and Pelletier J. In: Mutlu M., Dinescu G., Förch R., Martín-Martínez J.M., and Vyskocil J. (Eds). Plasma Polymers and Related Materials (2005), Hacettepe University Press, Ankara 1.
10. Anders A. Surf. Coat. Technol. 200 (2005) 1893
11. Martinu L., Raveh A., Domingue A., Bertrand L., Klemberg-Sapieha J.E., Gujrathi S.C., and Wertheimer M.R. Thin Solid Films 208 (1992) 42
12. Reece Roth J. Industrial Plasma Engineering. Volume 1: Principles (1995), IOP, Bristol 507
13. Asmussen Jr. J., Grotjohn T.A., Mak P., and Perrin M.A. IEEE Trans. Plasma Sci. 25 (1997) 1196
14. Inaba H., Fujimaki S., Furusawa K., and Todoroki S. Vacuum 66 (2002) 487
15. Corbella C., Bialuch I., Kleinschmidt M., and Bewilogua K. 50th SVC Annual Technical Conference Proceedings (2007) 616
16. Shin C.B., Hur J.S., and Oh S.G. Thin Solid Films 341 (1999) 18
17. Kim M.T., and Lee J. Thin Solid Films 303 (1997) 173
18. Yasuda H. Luminous Chemical Vapour Deposition and Interface Engineering (2005), Marcel Dekker, New York 251
19. Soum-Glaude A., Thomas L., Dollet A., Ségur P., and Bordage M.C. Diamond Relat. Mater. 16 (2007) 1259